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    2. Turnkey

      Nikon stepper NSR2205 i14

      Nikon stepper NSR2205 i14

      • Wafer size: 150mm or 200mm , Flat and notch wafers
      • Resolution: 0.35um
      • Focus Repeatability: within 0.08um (3σ)
      • Distortion: Within+/-0.04um
      • ORT: Within +/-0.1 sec
      • Uniformity: less than <1.5%
      • Intensity: More than 650 mw/cm2
      • Reticle blind: 0.4mm~0.8mm (on reticle)
      • Wafer flatness: Within 2.5um
      • Stepping: 3σ within 0.03um
      Nikon stepper NSR2205 i12

      Nikon stepper NSR2205 i12

      • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
      • Resolution: 0.35um
      • Focus Repeatability: within 0.15um (3σ)
      • Distortion: Within+/-0.04um
      • ORT: Within +/-0.1 sec
      • Uniformity: less than <1.5%
      • Intensity: More than 600 mw/cm2
      • Reticle blind: 0.4mm~0.8mm (on reticle)
      • Wafer flatness: Within 2.5um
      • Stepping: 3σ within 0.04um
      Nikon stepper NSR2205 i11

      Nikon stepper NSR2205 i11

      • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
      • Resolution: 0.4um
      • Focus Repeatability: within 0.15um (3σ)
      • Distortion: Within+/-0.045um
      • ORT: Within +/-0.1 sec
      • Uniformity: less than <1.5%
      • Intensity: More than 600 mw/cm2
      • Reticle blind: 0.4mm~0.8mm (on reticle)
      • Wafer flatness: Within 2.5um
      • Stepping: 3σ within 0.05um
      Nikon stepper NSR2005 i10

      Nikon stepper NSR2005 i10

      • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
      • Resolution: 0.45um
      • Depth of focus: <0.6um
      • Distortion: Within+/-0.6um
      • ORT: Within +/-0.1 sec
      • Uniformity: less than <1.5%
      • Intensity: More than 550 mw/cm2
      • Reticle blind: 0.4mm~0.8mm (on reticle)
      • Wafer flatness: Within 2.5um
      • Stepping: 3σ within 0.065um
      Nikon stepper NSR2005 i9

      Nikon stepper NSR2005 i9

      • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
      • Resolution: 0.5um
      • Depth of focus: <0.6um
      • Distortion: Within+/-0.65um
      • ORT: Within +/-0.15 sec
      • Uniformity: less than <1.5%
      • Intensity: More than 500 mw/cm2
      • Reticle blind: 0.4mm~0.8mm (on reticle)
      • Wafer flatness: Within 2.5um
      • Stepping: 3σ within 0.065um
      Nikon stepper NSR2005 i8

      Nikon stepper NSR2005 i8

      • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
      • Resolution: 0.5um (8 inch wafer)
      • Depth of focus: <0.6um
      • Distortion: Within+/-0.07um
      • ORT: Within +/-0.2 sec
      • Uniformity: less than <2%
      • Intensity: More than 500 mw/cm2
      • Pre-alignment accuracy: 3sigma<5um
      • Wafer flatness: within +/-1.5sec
      • Stepping: 3σ within 0.07um
      Nikon stepper NSR1755 i7

      Nikon stepper NSR1755 i7

      • Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
      • Resolution: 0.55um (8 inch wafer)
      • Depth of focus: <0.6um
      • Distortion: Within+/-0.08um
      • Astigmatism: less than 2.0 μm
      • Uniformity: less than <2%
      • Intensity: More than 500 mw/cm2
      • Pre-alignment accuracy: 3sigma<5um
      • Chip leveling (accuracy): within +/-1.5sec
      • Stepping: 3σ within 0.08um
      电玩捕鱼